Current Issue : October - December Volume : 2018 Issue Number : 4 Articles : 5 Articles
A boron-doped carbon nano-/microballs (BC) was successfully obtained via a two-step procedure including hydrothermal reaction\n(180âË?Ë?C) and carbonization (800âË?Ë?C) with cheap starch and H3BO3 as the carbon and boron source. As a new kind of boron-doped\ncarbon, BC contained 2.03 at% B-content and presented the morphology as almost perfect nano-/microballs with different sizes\nranging from 500nm to 5 ...
Direct growth of uniform wafer-scale two-dimensional (2D) layered materials using a universal method is of vital importance for\nutilizing 2D layers into practical applications. Here, we report on the structural and transport properties of large-scale few-layer\nMoS2 back-gated field effect transistors (FETs), fabricated using conventional pulsed laser deposition (PLD) technique. Raman\nspectroscopy and transmission electron microscopy results confirmed that the obtained MoS2 layers on SiO2/Si substrate are\nmultilayers. The FETs devices exhibit a relative high on/off ratio of 5 Ã?â?? 102 and mobility of 0.124 cm2VâË?â??1SâË?â??1. Our results suggest that\nthe PLD would be a suitable pathway to grow 2D layers for future industrial device applications....
The development of metallic fluorescent materials, ...
Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods as the conventional\nphotolithography comes with its intrinsic resolution limit. In this regard, some promising techniques have been proposed as\nnext-generation lithography (NGL) that has the potentials to achieve both high-volume production and very high resolution.\nThis article reviews the promising NGL techniques and introduces the challenges and a perspective on future\ndirections of the NGL techniques. Extreme ultraviolet lithography (EUVL) is considered as the main candidate for sub-10-\nnm manufacturing, and it could potentially meet the current requirements of the industry. Remarkable progress in EUVL\nhas been made and the tools will be available for commercial operation soon. Maskless lithography techniques are used for\npatterning in R&D, mask/mold fabrication and low-volume chip design. Directed self-assembly has already been realized\nin laboratory and further effort will be needed to make it as NGL solution. Nanoimprint lithography has emerged\nattractively due to its simple process steps, high throughput, high resolution and low cost and become one of the\ncommercial platforms for nanofabrication. However, a number of challenging issues are waiting ahead, and further\ntechnological progresses are required to make the techniques significant and reliable to meet the current demand. Finally, a\ncomparative study is presented among these techniques....
Ti-doped zinc oxide and pure zinc oxide nanoparticles were synthesized by a modified oxalate route using Averrhoa carambola\nfruit juice as a natural source of oxalate. The characteristics of the precursors have been investigated by FTIR, TGA, and XRD.The\nresults from the investigation revealed that the precursors are zinc oxalate and Ti-doped zinc oxalate which readily decompose at\n450âË?Ë?C. The as-prepared precursors were calcined at 450âË?Ë?C for 4 hours, and the decomposition products have been characterized\nby XRD, SEM, EDX, and VSM. XRD results revealed crystallinity with hexagonal wurtzite structure, while the average grain size\nwas found to be 26nm for Ti-doped ZnO and 29nm for ZnO, using calculations based on Debye-Scherrer equation. Furthermore,\nthe morphological studies by SEM showed particle agglomeration, while the presence of Ti3+ in the zinc oxide lattice is indicated\nby EDS analysis. Finally the hysteresis loop fromVSM results shows that Ti-doped ZnO exhibits ferromagnetism....
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